hf etching quartz osl



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Optically stimulated luminescence is a method of

Finally etching with HF is performed to remove the outermost rind of the quartz grain All of the processing must be done under dark-room conditions The main component of an OSL laboratory is the Reader Figure 2...

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A SIMPLE METHOD TO SEPARATE QUARTZ AND FELDSPAR

Keywords quartz dating feldspar dating OSL IRSL 1 INTRODUCTION The dating of sediment and geological events is one of the main applications of the luminescence method The After the second etching with HF the feldspar abundance was measured in each fraction S1 and L1 taken as starting abundance for the comparison...

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Etching with Hydrofluoric Acid

Etching of SiO 2 Quartz and Glasses with HF Hydrofluoric acid is the only etchant which attacks amorphous SiO 2 quartz or glasses at significant high etch rate However HF is not only a strong corrosive but also highly toxic towards higher concentra-tions Local effects include tissue destruction and necrosis deaths have been reported from...

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OSL chronostratigraphy for loess deposits from Tyszowce

Nov 30 2017 0183 32 The quartz grains were separated using density separation with the application of sodium polytungstate solutions leaving grains of densities between 262 g/cm 3 and 275 g/cm 3 The grains were sieved before etching with concentrated hydrofluoric acid HF 40 min...

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Study on Surface Roughness Improvement of Fused Quartz

HF/HCl etching is reported to create a smoother surface on Pyrex and soda-lime-glass than the HF etching 4 BOE is reported to improve the surface of fused quartz devices 5 However no...

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Surface Roughness of Z

When using common etching solutions HF HF NH4F NH4HF2 the etched surface of quartz tends to be covered with hillocks and form a rough surface This may be detrimental to applications There are not many effective methods to improve the etched quartz surface quality to get mechanically reliable devic...

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Luminescence dating of buried cobble surfaces from sandy

Wintle 2003 was used for quartz OSL measurements Quartz extracts were heated to 200 176 C for 10 s and to 180 176 C for 0 s after giving the natural/regenerative and testdoses respectively andstimulatedwithbluediodesat 125 176 C for 40 s Table 1 High-temperature blue-light stimulation at 280 176 C was also performed at the end of...

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A SIMPLE METHOD TO SEPARATE QUARTZ AND FELDSPAR

Keywords quartz dating feldspar dating OSL IRSL 1 INTRODUCTION The dating of sediment and geological events is one of the main applications of the luminescence method The After the second etching with HF...

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APPLICATION Introduction to BRIEF HF Vapor Etch

Silicon oxide is typically etched by hydrogen fluoride SiO 2 4 HF SiF 4 g 2 H 2 O The most widespread method of HF based etch release is wet chemical etching using a mixture of HF and water However as the HF or subsequent rinsing solutions dry it can cause stiction by pulling the free-moving microstuctures together which remain...

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THE EFFECT OF HF ACID ETCHING ON THE MORPHOLOGY OF QUARTZ

The assumption of isotropic etching in hydrofluoric acid of quartz grains prepared for thermoluminescence dating has been tested by optical and scanning electron microscopy We have found that the rate of etch is very irregular over the surface of many grains and that some grains are attacked much more severely than others...

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Study on Surface Roughness Improvement of Fused Quartz

HF/HCl etching is reported to create a smoother surface on Pyrex and soda-lime-glass than the HF etching 4 BOE is reported to improve the surface of fused quartz devices 5 However no systematic studies and comparative analyses have been reported in...

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KOH wet etching technique for patterned formation on

Aug 11 2016 0183 32 The etching of the quartz crystal was carried out using KOH concentration of 25 30 and 35 by weight at a temperature of 80 176 C for 2 hours Aurum palladium AuPd was used as a mask to protect the rest of the quartz crystal The AuPd mask was coated on the quartz...

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A method for the removal of mica from quartz separates

with concentrated HF so fine grain quartz contamination seems unlikely but it is possible during manual mounting of mica grains that quartz grains were inadvertently included In order to check this we measured OSL and TL on museum specimens of mica muscovite and compared them with the signal from sedimentary mica and purified quartz...

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HF Etching

HF etching is a form of wet etching that uses hydrofluoric acid to etch out surfaces rather than using a dry plasma processHF etching is capable of etching materials such as amorphous silicon dioxide quartz and glass at very high etch ratSince HF etching is a wet process meaning that it uses chemicals it creates an isotropic etchThis means that there are curved etched out sections...

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Kinetics of the etching of quartz glass in hydrofluoric acid

Our investigation of the etching kinetics of quartz gtass at HF concentrations between 10 and 45 mass was conducted at room temperature We studied the temperature function of the etching rate at 20-80 for 20 HF...

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THE EFFECT OF HF ACID ETCHING ON THE MORPHOLOGY OF QUARTZ

The assumption of isotropic etching in hydrofluoric acid of quartz grains prepared for thermoluminescence dating has been tested by optical and scanning electron microscopy We have found that the rate of etch is very irregular over the surface of many grains and that some grains are attacked much more severely than others The uncertainty introduced into TL dating by this effect is...

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Historical mortars dating from OSL signals of fine grain

Sep 01 2013 0183 32 Historical mortars dating from OSL signals of fine grain fraction enriched in quartz Historical mortars dating from OSL signals of fine grain fraction enriched in quartz Stella Giuseppe Fontana Dorotea Gueli Anna Troja Sebastiano 2013-09-01 00 00 00 In the last years the mortar dating through Optically Stimulated Luminescence OSL...

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LUMINESCENCE SIGNALS AND EMISSIONS FROM GRAINS OF

Quartz grains have been prepared from Portuguese granite and pegmatite samples including repeated HF etching The quartz obtained from the granites is transparent and exhibits clean crystal facets little attacked by the HF...

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Historical mortars dating from OSL signals of fine grain

Sep 01 2013 0183 32 Historical mortars dating from OSL signals of fine grain fraction enriched in quartz Historical mortars dating from OSL signals of fine grain fraction enriched in quartz Stella Giuseppe Fontana Dorotea Gueli Anna Troja Sebastiano 2013-09-01 00 00 00 In the last years the mortar dating through Optically Stimulated Luminescence OSL techniques has become a viable support for...

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Ultradeep fused silica glass etching with an HF

quartz because of their optical transparency and chemical inertness Hydrofluoric acid HF solutions are the etching media of choice for deep etching into silicon dioxide substrates but processing schemes become complicated and expensive for etching times greater than 1 hour due to the aggressiveness of HF...

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Kinetics of the etching of quartz glass in hydrofluoric acid

Our investigation of the etching kinetics of quartz gtass at HF concentrations between 10 and 45 mass was conducted at room temperature We studied the temperature function of the etching rate at 20-80 for 20 HF solution The temperature was measured with a...

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Exploring the potential of luminescence techniques for

37 Full PDFs related to this paper READ PAPER Exploring the potential of luminescence techniques for dating Alpine rock glaciers - POSTER...

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Quartz sample pretreatments for TL/OSL dating Studies of

Apr 01 1994 0183 32 Quartz OSL ED as a function of etch time Equivalent dose Gy Sample 40 min HF 80 min HF 120 min HF CD01 Q 283 t 90 923 t 451 275 t 120 DLOIQ - 429 t 81 777 t 232 DL07Q 795 t 209 1068 t 161 - DL l OQ 223 t 75 688 t 304 - 3 There is some evidence that EDs may change as a result of etching time...

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Quartz separation with HF

QUARTZ SEPARATION BY SELECTIVE ETCHING WITH HF Summary For preparing very pure quartz separat Most silicate minerals dissolve faster than quartz in dilute HF and can be etched away to leave a very pure quartz residue Some quartz...

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LUMINESCENCE SIGNALS AND EMISSIONS FROM GRAINS OF

Quartz grains have been prepared from Portuguese granite and pegmatite samples including repeated HF etching The quartz obtained from the granites is transparent and exhibits clean crystal facets little attacked by the HF That from pegmatites is milky and exhibits severe pitting AG1 from Pegmatite MUR4 from Granite Approx 3 mm 0 500 1000...

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Surface Roughness of Z

When using common etching solutions HF HF NH4F NH4HF2 the etched surface of quartz tends to be covered with hillocks and form a rough surface This may be detrimental to applications There are not many effective methods to improve the etched quartz...

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Ultradeep fused silica glass etching with an HF

quartz because of their optical transparency and chemical inertness Hydrofluoric acid HF solutions are the etching media of choice for deep etching into silicon dioxide substrates but processing schemes become complicated and expensive for etching times greater than 1 hour due to the aggressiveness of HF migration through most masking...

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KOH wet etching technique for patterned formation on

Aug 11 2016 0183 32 The etching of the quartz crystal was carried out using KOH concentration of 25 30 and 35 by weight at a temperature of 80 176 C for 2 hours Aurum palladium AuPd was used as a mask to protect the rest of the quartz crystal The AuPd mask was coated on the quartz crystal by a sputter coater in a high vacuum chamber...

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Removal of the feldspar

curves of OSL and post-IR OSL and rejected quartz grains with OSL decay curves that did not reach background within 1 s of laser stimulation Besides these relatively quantitative approaches a qualitative Sample Etch procedure HF min Post-IR OSL/OSL IR/TL TL/TL IRSL LV 01 0 4833 177 0002 173 177 009 22929 177 00001 340207 177 1669...

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Extended range luminescence dating of quartz and alkali

Optically stimulated luminescence OSL on quartz is an established technique for dating late Pleistocene to late For quartz etching 3 gr of the non-magnetic fraction went through etching in concentrated 40 HF...

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